review Open AccessTop 1% cited
Ionized physical vapor deposition (IPVD): A review of technology and applications
Thin Solid Films · 2006 · Vol. 513(1-2) · pp. 1–24
Ulf Helmersson✉(Linköping University)Martina Lattemann(Linköping University)Johan Böhlmark(Linköping University)Arutiun P. Ehiasarian(Sheffield Hallam University)Jón Tómas Guðmundsson(University of Iceland)
Metal and Thin Film MechanicsDiamond and Carbon-based Materials ResearchSemiconductor materials and devicesHigh-power impulse magnetron sputteringSputteringSputter depositionCavity magnetronPhysical vapor depositionThin filmArgonChemistryIonMaterials science
Citations
1,045
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72.72
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References
170
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References
Fundamental understanding and modeling of reactive sputtering processes
Thin Solid Films · 2005 · 690 citations
Pulsed magnetron sputter technology
Surface and Coatings Technology · 1993 · 336 citations
Physics of Thin Films
Journal of The Electrochemical Society · 1964 · 1,758 citations
A novel pulsed magnetron sputter technique utilizing very high target power densities
Surface and Coatings Technology · 1999 · 1,046 citations
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