articleTop 1% cited
Pulsed magnetron sputter technology
Surface and Coatings Technology · 1993 · Vol. 61(1-3) · pp. 331–337
S. Schiller✉(Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology)K. Goedicke(Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology)J. Reschke(Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology)V. W. J. H. Kirchhoff(Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology)Susanne Schneider(Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology)F. Milde(Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology)
Metal and Thin Film MechanicsDiamond and Carbon-based Materials ResearchIon-surface interactions and analysisMaterials sciencePulsed DCSputter depositionElectric arcPlasmaSputteringCavity magnetronTinAnodeOptoelectronics
Citations
336
FWCI
11.72
field-weighted impact
References
12
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99%
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