articleTop 10% cited
A novel pulsed magnetron sputter technique utilizing very high target power densities
Surface and Coatings Technology · 1999 · Vol. 122(2-3) · pp. 290–293
V. Kouznetsov✉(Linköping University)K. Macák(Linköping University)Jochen M. Schneider(Linköping University)Ulf Helmersson(Linköping University)I. Petrov(University of Illinois Urbana-Champaign)
Metal and Thin Film MechanicsCopper Interconnects and ReliabilityPlasma Diagnostics and ApplicationsMaterials scienceHigh-power impulse magnetron sputteringSputter depositionCavity magnetronPower densitySubstrate (aquarium)TrenchDeposition (geology)SputteringPlasma
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1,046
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5.23
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6
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