article Open AccessTop 1% cited
On the film density using high power impulse magnetron sputtering
Surface and Coatings Technology · 2010 · Vol. 205(2) · pp. 591–596
Mattias Samuelsson✉(Impact Coatings (Sweden))Daniel Lundin(Linköping University)J. Jensen(Thinfilm (Sweden))M. A. Raadu(KTH Royal Institute of Technology)Jón Tómas Guðmundsson(University of Iceland)Ulf Helmersson(Linköping University)
Metal and Thin Film MechanicsPlasma Diagnostics and ApplicationsDiamond and Carbon-based Materials ResearchHigh-power impulse magnetron sputteringMaterials scienceSputter depositionThin filmCavity magnetronMicrostructureSputteringPower densityPlasmaIon
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408
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37
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100%
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References
A novel pulsed magnetron sputter technique utilizing very high target power densities
Surface and Coatings Technology · 1999 · 1,046 citations
Ionized physical vapor deposition (IPVD): A review of technology and applications
Thin Solid Films · 2006 · 1,045 citations
Probability and Statistics for Engineering and the Sciences.
Biometrics · 1991 · 2,521 citations
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