articleTop 1% cited
Fundamental understanding and modeling of reactive sputtering processes
Thin Solid Films · 2005 · Vol. 476(2) · pp. 215–230
S. Berg✉(Uppsala University)Tomas Nyberg(Uppsala University)
Metal and Thin Film MechanicsSemiconductor materials and devicesCopper Interconnects and ReliabilitySputteringDeposition (geology)StoichiometryProcess engineeringProcess (computing)Materials scienceProcess controlCharacterization (materials science)Thin filmNanotechnology
Funding
- Stiftelsen för Strategisk Forskning
Citations
690
FWCI
55.58
field-weighted impact
References
22
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100%
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References
Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
Surface and Coatings Technology · 2000 · 519 citations
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