Physical Sciences → Engineering → Electrical and Electronic Engineering
Semiconductor materials and devices
This cluster of papers focuses on the advances in atomic layer deposition (ALD) technology, particularly in the context of high-k dielectrics, gate oxides, and semiconductor devices. It covers topics such as thin film growth, dielectric breakdown mechanisms, metal gate transistors, interface engineering, and the impact of negative bias temperature instability (NBTI) degradation on device performance.
191.6K works worldwide2.6M citations
Atomic Layer DepositionHigh-k DielectricsGate OxidesSemiconductor DevicesNanoelectronicsThin Film GrowthDielectric BreakdownMetal Gate TransistorsInterface EngineeringNBTI Degradation
Journals publishing in this area
13
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
ISSN 0168-583X2,900 articles in this topic
179h-index
1.49Impact
42.3KArticles
558KCitations
28
Journal of materials research/Pratt's guide to venture capital sources
ISSN 0884-1616940 articles in this topic
210h-index
2.18Impact
16.1KArticles
485.2KCitations
36

International Journal of Research in Circuits Devices and Systems
ISSN 2708-45316 articles in this topic
1h-index
0.07Impact
61Articles
4Citations
39

International Journal of Research in Advanced Electronics Engineering
ISSN 2708-45581 articles in this topic
1h-index
0.16Impact
48Articles
7Citations







