articleTop 1% cited
Control of reactive sputtering processes
Thin Solid Films · 2005 · Vol. 491(1-2) · pp. 1–17
W.D. Sproul✉D.J. Christie(Advanced Energy (United States))D.C. Carter(Advanced Energy (United States))
Metal and Thin Film MechanicsPlasma Diagnostics and ApplicationsSemiconductor materials and devicesSputteringPartial pressureElectric arcDeposition (geology)ChemistryReactive materialAC powerAnalytical Chemistry (journal)Volumetric flow rateMaterials science
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References
Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
Surface and Coatings Technology · 2000 · 519 citations
A novel pulsed magnetron sputter technique utilizing very high target power densities
Surface and Coatings Technology · 1999 · 1,046 citations
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