articleTop 1% cited
Reactive magnetron sputtering of thin films: present status and trends
Thin Solid Films · 2004 · Vol. 475(1-2) · pp. 208–218
J. Musil✉(Czech Academy of Sciences, Institute of Physics)Pavel Baroch(University of West Bohemia)J. Vlček(University of West Bohemia)K.H. Nam(Sungkyunkwan University)Jung‐Hoon Han(Sungkyunkwan University)
Metal and Thin Film MechanicsSemiconductor materials and devicesZnO doping and propertiesSputteringCavity magnetronSputter depositionThin filmMaterials scienceHigh-power impulse magnetron sputteringPulsed DCOxideAnalytical Chemistry (journal)Optoelectronics
Funding
- Ministerstvo Školství, Mládeže a Tělovýchovy
Citations
392
FWCI
16.24
field-weighted impact
References
55
Percentile
100%
vs. same field & year
Citations per year
References
Pulsed magnetron sputter technology
Surface and Coatings Technology · 1993 · 336 citations
Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
Surface and Coatings Technology · 2000 · 519 citations
Electrochemical Photolysis of Water at a Semiconductor Electrode
Nature · 1972 · 33,230 citations
Hard and superhard nanocomposite coatings
Surface and Coatings Technology · 2000 · 1,058 citations
Citation Network
How this paper connects to the literature. Drag to explore, click any node to open that paper.