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Metal-(n) AlGaAs-GaAs two-dimensional electron gas FET

IEEE Transactions on Electron Devices · 1982 · Vol. 29(6) · pp. 955–960
D. DelagebeaudeufNuyen T. Linh

Abstract

Theoretical calculations have been developed for a two-dimensional electron gas FET (TEGFET) constituted by a AlGaAs (n)-GaAs (n <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-</sup> or p <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-</sup> ) heterostructure in which the Schottky gate is deposited on the AlGaAs(n) top layer. The theory takes into account: i) the subband splitting in the two-dimensional electron gas (2-DEG); and ii) the existence of an undoped AlGaAs spacer layer which has been found to enhance the electron mobility. The sheet carrier concentration of the TEGFET has been calculated, and a simple analytical formula has been established for the charge control in large and small gate FET.

Semiconductor materials and devicesElectronic and Structural Properties of OxidesSemiconductor Quantum Structures and DevicesHeterojunctionFermi gasSchottky diodeElectronGallium arsenideMetalElectron mobilityMaterials scienceOptoelectronicsField-effect transistor
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