articleTop 1% cited
Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
Thin Solid Films · 1997 · Vol. 292(1-2) · pp. 135–144
A. W. Ott✉(University of Colorado Boulder)J. W. Klaus(University of Colorado Boulder)J. M. Johnson(University of Colorado Boulder)Steven M. George(University of Colorado Boulder)
Semiconductor materials and devicesZnO doping and propertiesOptical Coatings and GratingsSubstrate (aquarium)EllipsometryAnalytical Chemistry (journal)ChemistryThin filmSurface roughnessDeposition (geology)Chemical vapor depositionReaction rateChemical reaction
Funding
- National Science Foundation
Citations
508
FWCI
12.91
field-weighted impact
References
50
Percentile
99%
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Citations per year
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References
American Institute of Physics Handbook
American Journal of Physics · 1964 · 3,000 citations
Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
Surface Science · 1995 · 458 citations
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