articleTop 10% cited
Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
Surface Science · 1995 · Vol. 322(1-3) · pp. 230–242
Anne C. Dillon(University of Colorado Boulder)A. W. Ott(University of Colorado Boulder)J. Douglas Way(Colorado School of Mines)Steven M. George✉(University of Colorado Boulder)
Semiconductor materials and devicesZnO doping and propertiesSilicon Nanostructures and PhotoluminescenceFourier transform infrared spectroscopyChemistryInfrared spectroscopyAmorphous solidAnalytical Chemistry (journal)AbsorbanceInfraredDeposition (geology)Chemical vapor depositionChemical engineering
Citations
458
FWCI
7.40
field-weighted impact
References
50
Percentile
97%
vs. same field & year
Citations per year
Cited by
Very low surface recombination velocities on p-type silicon wafers passivated with a dielectric with fixed negative charge
Solar Energy Materials and Solar Cells · 2006 · 433 citations
Atomic Layer Deposition: An Overview
Chemical Reviews · 2009 · 5,574 citations
Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
Review of Scientific Instruments · 2002 · 554 citations
Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
Thin Solid Films · 1997 · 508 citations
Low-Temperature Al<sub>2</sub>O<sub>3</sub> Atomic Layer Deposition
Chemistry of Materials · 2004 · 1,350 citations
Catalyst Design with Atomic Layer Deposition
ACS Catalysis · 2015 · 762 citations
Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates
Thin Solid Films · 2002 · 719 citations
Citation Network
How this paper connects to the literature. Drag to explore, click any node to open that paper.