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A SAXS/WAXS/GISAXS Beamline with Multilayer Monochromator
Journal of Physics Conference Series · 2010 · Vol. 247 · pp. 012007–012007
Alexander Hexemer✉(Lawrence Berkeley National Laboratory)Wim Bras(Dutch Research Council)James M. Glossinger(Lawrence Berkeley National Laboratory)Eric Schaible(Lawrence Berkeley National Laboratory)Eliot Gann(Lawrence Berkeley National Laboratory)Richard A. Kirian(Lawrence Berkeley National Laboratory)Alastair A. MacDowell(Lawrence Berkeley National Laboratory)Matthew Church(Lawrence Berkeley National Laboratory)B. Rude(Lawrence Berkeley National Laboratory)H. A. Padmore(Lawrence Berkeley National Laboratory)
Abstract
We discuss the construction of a new SAXS/WAXS beamline at the Advanced Light Source at Lawrence Berkeley Laboratory. The beamline is equipped with a multilayer monochromator in order to obtain a high X-ray flux. The detrimental effects that the increased bandwidth transmitted by this monochromator could have on the data quality of the SAXS and WAXS patterns is shown to be negligible for the experimental program intended to be operated on this beamline.
Advanced X-ray Imaging TechniquesAdvancements in Photolithography TechniquesAdvanced Electron Microscopy Techniques and ApplicationsBeamlineMonochromatorSmall-angle X-ray scatteringOpticsMaterials scienceGrazing-incidence small-angle scatteringScatteringSynchrotronCrystallographyPhysics
Funding
- U.S. Department of Energy
- Basic Energy Sciences
- Lawrence Berkeley National Laboratory
Citations
534
FWCI
6.21
field-weighted impact
References
24
Percentile
96%
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