Advancements in Photolithography Techniques

This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.

Journals publishing in this area

1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

ISSN 0277-786X17,193 articles in this topic

234h-index

436.5KArticles

1.9MCitations