articleTop 1% cited
Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy
Applied Physics A · 1986 · Vol. 39(2) · pp. 73–82
M. Grundner✉(Wacker Group (Germany))H.‐E. Jacob(Wacker Group (Germany))
Electron and X-Ray Spectroscopy TechniquesSemiconductor materials and devicesAdvanced Electron Microscopy Techniques and ApplicationsX-ray photoelectron spectroscopyWaferHigh resolution electron energy loss spectroscopyOxideMaterials scienceElectron energy loss spectroscopyChemical stateSiliconSpectroscopySurface energy
Citations
411
FWCI
12.16
field-weighted impact
References
27
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99%
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Citations per year
Cited by
Ideal hydrogen termination of the Si (111) surface
Applied Physics Letters · 1990 · 1,389 citations
References
Vibrational study of the initial stages of the oxidation of Si(111) and Si(100) surfaces
Applied Physics A · 1982 · 348 citations
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