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A comprehensive study on the structural evolution of HfO<sub>2</sub>thin films doped with various dopants

Journal of Materials Chemistry C · 2017 · Vol. 5(19) · pp. 4677–4690
Min Hyuk ParkTony SchenkChris M. FancherEverett D. GrimleyChuanzhen ZhouClaudia RichterJames M. LeBeauJacob L. JonesThomas MikolajickUwe Schroeder

Abstract

Quantitative phase analysis is first performed on doped Hafnia films to elucidate the structural origin of unexpected ferroelectricity.

Ferroelectric and Negative Capacitance DevicesSemiconductor materials and devicesMXene and MAX Phase MaterialsHafniaMaterials scienceDopantDopingFerroelectricityThin filmPhase (matter)NanotechnologyOptoelectronicsCeramic

Funding

  • Deutsche Forschungsgemeinschaft
  • Army Research Office
Citations
333
FWCI
14.13
field-weighted impact
References
89
Percentile
99%
vs. same field & year
Citations per year
References
Ferroelectricity in hafnium oxide thin films
Applied Physics Letters · 2011 · 2,609 citations
Rietveld refinement guidelines
Journal of Applied Crystallography · 1999 · 2,242 citations
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