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Optically pumped lasing of ZnO at room temperature
Applied Physics Letters · 1997 · Vol. 70(17) · pp. 2230–2232
Darren M. Bagnall✉(Tohoku University)Y. F. Chen(Tohoku University)Z. Q. Zhu(Tohoku University)T. Yao(Tohoku University)S. Koyama(Tohoku University)Mengyan Shen(Tohoku University)T. Goto(Tohoku University)
Abstract
We report the observation of optically pumped lasing in ZnO at room temperature. Thin films of ZnO were grown by plasma-enhanced molecular beam epitaxy on (0001) sapphire substrates. Laser cavities formed by cleaving were found to lase at a threshold excitation intensity of 240 kW cm−2. We believe these results demonstrate the high quality of ZnO epilayers grown by molecular beam epitaxy while clearly demonstrating the viability of ZnO based light emitting devices.
ZnO doping and propertiesGaN-based semiconductor devices and materialsSemiconductor Quantum Structures and DevicesLasing thresholdMolecular beam epitaxySapphireMaterials scienceOptoelectronicsLaserWide-bandgap semiconductorExcitationEpitaxyThin film
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References
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Journal of Applied Physics · 1994 · 2,696 citations
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