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Optically pumped lasing of ZnO at room temperature

Applied Physics Letters · 1997 · Vol. 70(17) · pp. 2230–2232
Darren M. BagnallY. F. ChenZ. Q. ZhuT. YaoS. KoyamaMengyan ShenT. Goto

Abstract

We report the observation of optically pumped lasing in ZnO at room temperature. Thin films of ZnO were grown by plasma-enhanced molecular beam epitaxy on (0001) sapphire substrates. Laser cavities formed by cleaving were found to lase at a threshold excitation intensity of 240 kW cm−2. We believe these results demonstrate the high quality of ZnO epilayers grown by molecular beam epitaxy while clearly demonstrating the viability of ZnO based light emitting devices.

ZnO doping and propertiesGaN-based semiconductor devices and materialsSemiconductor Quantum Structures and DevicesLasing thresholdMolecular beam epitaxySapphireMaterials scienceOptoelectronicsLaserWide-bandgap semiconductorExcitationEpitaxyThin film
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References
The Luminescence of ZnO under High One‐ and Two‐Quantum Excitation
physica status solidi (b) · 1975 · 598 citations
Optically pumped ultraviolet lasing from ZnO
Solid State Communications · 1996 · 533 citations
Optical Processes in Semiconductors
Journal of The Electrochemical Society · 1972 · 4,624 citations
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