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Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition

Nanotechnology · 2008 · Vol. 19(30) · pp. 305604–305604
Alexander MalesevicRoumen VitchevKoen SchoutedenAlexander VolodinLiang ZhangGustaaf Van TendelooAnnick VanhulselChris Van Haesendonck

Abstract

If graphene is ever going to live up to the promises of future nanoelectronic devices, an easy and cheap route for mass production is an essential requirement. A way to extend the capabilities of plasma-enhanced chemical vapour deposition to the synthesis of freestanding few-layer graphene is presented. Micrometre-wide flakes consisting of four to six atomic layers of stacked graphene sheets have been synthesized by controlled recombination of carbon radicals in a microwave plasma. A simple and highly reproducible technique is essential, since the resulting flakes can be synthesized without the need for a catalyst on the surface of any substrate that withstands elevated temperatures up to 700 °C. A thorough structural analysis of the flakes is performed with electron microscopy, x-ray diffraction, Raman spectroscopy and scanning tunnelling microscopy. The resulting graphene flakes are aligned vertically to the substrate surface and grow according to a three-step process, as revealed by the combined analysis of electron microscopy and x-ray photoelectron spectroscopy.

Graphene research and applicationsSemiconductor materials and devicesDiamond and Carbon-based Materials ResearchGrapheneMaterials scienceRaman spectroscopyChemical vapor depositionX-ray photoelectron spectroscopyScanning electron microscopeSubstrate (aquarium)Layer (electronics)NanotechnologyChemical engineering
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