articleTop 10% cited
Oxidation of Ge(100) and Ge(111) surfaces: an UPS and XPS study
Surface Science · 1995 · Vol. 325(3) · pp. 263–271
K. Prabhakaran✉(NTT Basic Research Laboratories)T. Ogino(NTT Basic Research Laboratories)
Semiconductor materials and devicesElectron and X-Ray Spectroscopy TechniquesElectronic and Structural Properties of OxidesX-ray photoelectron spectroscopyAnnealing (glass)Binding energyGermaniumOxideAnalytical Chemistry (journal)In situUltravioletChemical stateMaterials science
Citations
445
FWCI
5.29
field-weighted impact
References
22
Percentile
95%
vs. same field & year
Citations per year
References
Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBE
Journal of The Electrochemical Society · 1986 · 1,621 citations
Physics and applications of Ge<sub>x</sub>Si<sub>1-x</sub>/Si strained-layer heterostructures
IEEE Journal of Quantum Electronics · 1986 · 705 citations
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