articleTop 1% cited
Atomic layer deposition (ALD): from precursors to thin film structures
Thin Solid Films · 2002 · Vol. 409(1) · pp. 138–146
Markku Leskelä✉(University of Helsinki)Mikko Ritala(University of Helsinki)
Semiconductor materials and devicesElectronic and Structural Properties of OxidesCatalytic Processes in Materials ScienceAtomic layer depositionMicroelectronicsDeposition (geology)NitrideThin filmMaterials scienceDielectricNanotechnologyLayer (electronics)Metal
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References
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Journal of Applied Physics · 2001 · 5,826 citations
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