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Mg x Zn 1−x O as a II–VI widegap semiconductor alloy

Applied Physics Letters · 1998 · Vol. 72(19) · pp. 2466–2468
Akira OhtomoM. KawasakiTakashi KoidaK. MasubuchiHideomi KoinumaYu SakuraiYuko YoshidaTakashi YasudaYasutomo Segawa

Abstract

We propose a widegap II–VI semiconductor alloy, MgxZn1−xO, for the fabrication of heteroepitaxial ultraviolet light emitting devices based on ZnO. The c-axis oriented MgxZn1−xO films were epitaxially grown by pulsed laser deposition on ZnO epitaxial films and sapphire (0001) substrates using ceramic targets. Solid solution films were prepared with Mg content up to x=0.33, achieving a band gap of 3.99 eV at room temperature. MgO impurity phase segregated at x⩾0.36. Lattice constants of MgxZn1−xO films changed slightly (∼1%), increasing in a axis and decreasing in c-axis direction with increasing x. These films showed ultraviolet photoluminescence at energies from 3.36 (x=0) to 3.87 eV (x=0.33) at 4.2 K.

Ga2O3 and related materialsZnO doping and propertiesAdvanced Photocatalysis TechniquesEpitaxyPhotoluminescenceMaterials scienceAlloyImpurityUltravioletSemiconductorPulsed laser depositionLattice constantSapphire

Funding

  • Japan Society for the Promotion of Science
Citations
1,497
FWCI
12.69
field-weighted impact
References
13
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References
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