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Optimization of 5G microcircuit design using ANSYS HFSS and Photolithography: A performance evaluation study

International Journal of Electronics and Microcircuits · 2024 · Vol. 4(2) · pp. 44–49
3D IC and TSV technologiesAdditive Manufacturing and 3D Printing TechnologiesManufacturing Process and OptimizationHFSSPhotolithographyComputer scienceElectronic engineeringEngineeringManufacturing engineeringEngineering drawingMaterials scienceElectrical engineeringNanotechnology
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Optimization of 5G microcircuit design using ANSYS HFSS and Photolithography: A performance evaluation study · Scinovex