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Enhancing the output power of GaN-based LEDs grown on wet-etched patterned sapphire substrates

IEEE Photonics Technology Letters · 2006 · Vol. 18(10) · pp. 1152–1154
Ya‐Ju LeeJaeyeon HwangT. C. HsuM. H. HsiehM. J. JouB.J. LeeTien‐Chang LuHao‐Chung KuoS.C. Wang

Abstract

GaN-based light-emitting diodes (LEDs) with emitting wavelength of 450 nm were grown on patterned sapphire substrates (PSSs) fabricated by chemical wet etching. The crystallography-etched facet was {1-102} R-plane with a 57/spl deg/ against {0001} C-axis and had superior capability for enhancing light extraction efficiency. The light output power of the PSS LED was 1.15 times higher than that of the conventional LED at an injection current of 20 mA. The output power and external quantum efficiency were estimated to be 9 mW and 16.4%, respectively. The improvement was attributed not only to geometrical shapes of {1-102} crystallography-etched facets that efficiently scatter the guided light to find escape cones, but also to dislocation density reduction by adopting the PSS growth scheme.

GaN-based semiconductor devices and materialsGa2O3 and related materialsZnO doping and propertiesLight-emitting diodeMaterials scienceOptoelectronicsSapphireEtching (microfabrication)DiodeQuantum efficiencyWavelengthWide-bandgap semiconductorDislocation
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