Review of On-Chip Inductor Structures With Magnetic Films

Abstract

A comparison of on-chip inductors with magnetic materials from previous studies is presented and examined. Results from on-chip inductors with magnetic material integrated into a 90 nm CMOS processes are presented. The inductors use copper metallization and amorphous Co-Zr-Ta magnetic material. Inductance densities of up to 1700 nH/mm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> were obtained thanks to inductance increases of up to 31 times, significantly greater than previously published on-chip inductors. With such improvements, the effects of eddy currents, skin effect, and proximity effect become clearly visible at higher frequencies. Co-Zr-Ta was chosen for its good combination of high permeability, good stability at high temperature (> 250degC), high saturation magnetization, low magnetostriction, high resistivity, minimal hysteretic loss, and compatibility with silicon technology. The Co-Zr-Ta alloy can operate at frequencies up to 9.8 GHz, but trade-offs exist between frequency, inductance, and quality factor. Our inductors with thick copper and thicker magnetic films have dc resistances as low as 0.04 Omega, and quality factors of up to 8 at frequencies as low as 40 MHz.