articleTop 10% cited
Morphology and structure of TiO2 thin films grown by atomic layer deposition
Journal of Crystal Growth · 1995 · Vol. 148(3) · pp. 268–275
Jaan Aarik(University of Tartu)Aleks Aidla(University of Tartu)Teet Uustare✉(University of Tartu)Väino Sammelselg(Estonian Academy of Sciences)
Semiconductor materials and devicesCatalytic Processes in Materials ScienceElectronic and Structural Properties of OxidesAmorphous solidAnataseThin filmMaterials scienceRutileMorphology (biology)Layer (electronics)Deposition (geology)Surface roughnessCarbon film
Funding
- Eesti Teadusfondi
- Tartu Ülikool
Citations
299
FWCI
8.46
field-weighted impact
References
19
Percentile
98%
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Citations per year
Cited by
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
Journal of Applied Physics · 2005 · 2,551 citations
References
Electrical and optical properties of TiO2 anatase thin films
Journal of Applied Physics · 1994 · 1,760 citations
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