reviewTop 1% cited
Kinetics of formation of silicides: A review
Journal of materials research/Pratt's guide to venture capital sources · 1986 · Vol. 1(1) · pp. 205–221
F. M. d’Heurle✉(IBM (United States))P. Gaś(IBM (United States))
Semiconductor materials and interfacesHigh-Temperature Coating BehaviorsIntermetallics and Advanced Alloy PropertiesSilicideMaterials scienceNucleationDiffusionKineticsChemical physicsGrowth rateThermodynamicsSiliconStress relaxation
Citations
418
FWCI
11.97
field-weighted impact
References
97
Percentile
99%
vs. same field & year
Citations per year
Cited by
Silicides and ohmic contacts
Materials Chemistry and Physics · 1998 · 389 citations
Nucleation of a new phase from the interaction of two adjacent phases: Some silicides
Journal of materials research/Pratt's guide to venture capital sources · 1988 · 396 citations
References
Some aspects of the growth of diffusion layers in binary systems
Journal of Nuclear Materials · 1961 · 340 citations
General Relationship for the Thermal Oxidation of Silicon
Journal of Applied Physics · 1965 · 3,368 citations
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