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Synthesis of Large‐Area MoS<sub>2</sub> Atomic Layers with Chemical Vapor Deposition

Advanced Materials · 2012 · Vol. 24(17) · pp. 2320–2325
Yi‐Hsien LeeXinquan ZhangWenjing ZhangMu‐Tung ChangCheng‐Te LinKai‐Di ChangYa-Chu YuJacob Tse‐Wei WangChia‐Seng ChangLain‐Jong LiTsung‐Wu Lin

Abstract

Large-area MoS(2) atomic layers are synthesized on SiO(2) substrates by chemical vapor deposition using MoO(3) and S powders as the reactants. Optical, microscopic and electrical measurements suggest that the synthetic process leads to the growth of MoS(2) monolayer. The TEM images verify that the synthesized MoS(2) sheets are highly crystalline.

2D Materials and ApplicationsMXene and MAX Phase MaterialsGraphene research and applicationsChemical vapor depositionMaterials scienceMonolayerAtomic layer depositionDeposition (geology)Chemical engineeringNanotechnologyCombustion chemical vapor depositionLayer (electronics)Thin film

MeSH terms

DisulfidesGasesMolybdenumOxidesSilicon DioxideNanostructures
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