article Open AccessTop 1% cited
High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
Sensors and Actuators A Physical · 1998 · Vol. 64(1) · pp. 33–39
H. Lorenz✉(École Polytechnique Fédérale de Lausanne)M. Despont(IBM Research - Zurich)N. Fahrni(École Polytechnique Fédérale de Lausanne)Juergen Brügger(IBM Research - Zurich)P. Vettiger(IBM Research - Zurich)Philippe Renaud(École Polytechnique Fédérale de Lausanne)
Advanced MEMS and NEMS TechnologiesOptical Coatings and GratingsThin-Film Transistor TechnologiesResistPhotoresistMaterials scienceLIGAMicroelectromechanical systemsAspect ratio (aeronautics)ElectroplatingEpoxyOptoelectronicsLayer (electronics)
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