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On approach for estimation of maximal continuance of diffusion and ion type of doping
International Journal of Computing Programming and Database Management · 2024 · Vol. 5(1) · pp. 11–30
E.L. Pankratov✉(Radiophysical Research Institute)
Abstract
In this paper an analytical approach for estimation of maximal continuance of manufacturing of integrated circuit elements by dopant diffusion and ion implantation has been introduced. We analyzed influence of parameters of considered technological processes on the value of it's maximal continuance.Keywords: manufacturing of integrated circuit elements; dopant diffusion; ion implantation; maximal continuance of technological processes; analytical approach for prognosis.
Control Systems and IdentificationAdvanced MRI Techniques and ApplicationsSpectroscopy Techniques in Biomedical and Chemical ResearchContinuanceDopingDiffusionEstimationIonMaterials scienceCondensed matter physicsChemistryPsychologyOptoelectronics
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