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Thermodynamic stability of binary oxides in contact with silicon

K. J. HubbardDarrell G. Schlom
Nuclear materials and radiation effectsNuclear Materials and PropertiesElectronic and Structural Properties of OxidesTernary operationMaterials scienceSiliconOxideChemical stabilityBinary numberSilicon oxideTernary compoundThermodynamicsPhysical chemistry

Funding

  • Office of Naval Research
Citations
1,232
FWCI
5.08
field-weighted impact
References
123
Percentile
96%
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Cited by
Ferroelectricity in hafnium oxide thin films
Applied Physics Letters · 2011 · 2,609 citations
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