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Sputter Deposition of BiSrCaCuO Thin Films

Japanese Journal of Applied Physics · 1988 · Vol. 27(4A) · pp. L632–L632

Masao Fukutomi✉(Institute of Metals Research)Junichi Machida(Mitsui Mining & Smelting (Japan))Yoshiaki Tanaka(Institute of Metals Research)Toshihisa Asano(Institute of Metals Research)Hiroshi Maeda(Institute of Metals Research)Kazutomo Hoshino(Mitsui Mining & Smelting (Japan))

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Abstract

The sputter deposition of superconducting Bi-Sr-Ca-Cu-O thin films was studied with particular reference to the relation between the deposition conditions and the superconducting properties of the films obtained. After annealing, the films sputtered from a sintered Bi 1.3 Sr 1 Ca 1 Cu 1.5 O x target exhibited superconductivity with zero-resistance at 83 K. The possibility of obtaining high- T c superconducting film without post-deposition annealing was also demonstrated.

Physics of Superconductivity and Magnetism Copper Interconnects and Reliability Iron-based superconductors researchSuperconductivityAnnealing (glass)Thin filmSputteringMaterials scienceDeposition (geology)Sputter depositionAnalytical Chemistry (journal)High-temperature superconductivityMetallurgy

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Preparation of the High-Tc Phase of Bi-Sr-Ca-Cu-O Superconductor