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Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells

Thin Solid Films · 1999 · Vol. 351(1-2) · pp. 247–253
O. KluthB. RechLothar HoubenS. WiederG. SchöpeC. BenekingH. WagnerAnton LöfflHans‐Werner Schock
Thin-Film Transistor TechnologiesZnO doping and propertiesSilicon Nanostructures and PhotoluminescenceMaterials scienceEtching (microfabrication)Texture (cosmology)SiliconAmorphous solidOptoelectronicsAmorphous siliconThin filmSputter depositionLight scattering

Funding

  • Bundesministerium für Bildung und Forschung
Citations
526
FWCI
9.34
field-weighted impact
References
6
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References
Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
Japanese Journal of Applied Physics · 1985 · 546 citations
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